Latch-up Prevention in Merged Bipolar-MOS Structures for BiCMOS Applications

نویسندگان

  • S. Liang
  • L. Z. Hou
  • T. Gu
  • C. A. T. Salama
چکیده

BiCMOS technology [1] offers both the high driving capability of bipolar devices and the high input impedance of CMOS devices. The potential of BiCMOS technology has been demonstrated in a variety of applications such as gate arrays [2], static RAMs [3], dynamic RAMs [4] and microprocessors [5]. One of drawbacks of the conventional BiCMOS process is that the integration density is rather low since the MOS and bipolar devices are built in separate islands and interconnected externally. Furthermore, parasitic interconnect capacitance and resistance may cause substantial delay during transient operation. To overcome these problems, the use of physically merged bipolar-MOS devices in the implementation of BiCMOS circuits have been proposed [6-10]. Fig. 1 shows a complementary BiCMOS inverter circuit. The pull-up and pull-down transistors are a merged PMOS and NPN structure (BiPMOS) and a merged NMOS and PNP structure (BiNMOS).

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تاریخ انتشار 2007